Automated Optical Profiler for Dynamic MEMS Measurements

Veeco Instruments Inc. announced the introduction of its new automated Wyko(R) NT3300(TM) Optical Profiler with DMEMS (Dynamic Micro Electro Mechanical Systems) measurement option.
According to In-Stat Forecasts, the current rapid growth rate of MEMS sales will continue for the next several years, to a projected six billion units in 2009. With a corresponding, increasing number of unique micro-devices being used in consumer products, the MEMS industry requires metrology tools that can perform both static and dynamic characterization easily and rapidly. According to Jeannine Sargent, Executive Vice President/General Manager Metrology and Instrumentation, "Veeco's automated NT3300 DMEMS system fills this need, enabling manufacturers to accelerate both product reliability and functional development while driving down costs."

David Rossi, Vice President of Marketing, Metrology and Instrumentation, commented, "By adding the DMEMS measurement feature we are enabling further functionality to our best-selling, production-proven optical metrology platform. This option provides a dynamic means to non-destructively measure MEMS devices as they actuate." Manufacturers can use a single automated instrument to simultaneously measure in-plane and out-of-plane dimensions and motion for true assessment of micro-device functionality."
The DMEMS system utilizes a proprietary stroboscopic illuminator and synchronization electronics package that permits the capture of a series of 3D measurement data, generating a video of the sample device as it cycles through its range of motion. Comprehensive, MEMS-focused Wyko Vision(R) software locates features of interest and performs a wide variety of detailed 3D analyses, from determining resonant frequency and shape/distortion to characterizing deflection and other key device parameters.
Other features of the Wyko NT3300 DMEMS optical profiler include angstrom-resolution measurement of features from 0.1 nm to 2 mm in height, a programmable X/Y stage and software for rapid measurement of large surface areas, the ability to ramp intensity to investigate materials with differing reflectivities, and tip/tilt built into the head to eliminate the need to reposition the probe for successive scans.
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