Maskless Lithography System

Heidelberg Instruments, GmbH (Heidelberg, Germany) has installed a DWL66 maskless lithography system at Centre Spatial de Liege, located in Liege, Belgium.

The DWL 66 is high-resolution direct write pattern generator for low volume mask making and direct writing.

"Our new Heidelberg DWL66 system will be used for fabricating masks for a Laser-LIGA process operated in partnership with Technifutur, one of the major technical learning centers in our country. The aim of this collaboration is to propose and to implement new value-added microfabrication solutions into the local industries of the region. In combination with our existing microfabrication and metrology facilities, this new equipment will allow us to get in flexibility for investigating various domains of interest such as micro-fluidics, surface treatment, and diffractive and micro-optics for space and terrestrial applications". Mr. Denis Vandormael, researcher at CSL's microfabrication department

"We look forward to support CSL's microfabrication department with their applications using our field proven DWL66 laser lithography system", stated Alexander Forozan, Vice President of Sales and Marketing, Heidelberg Instruments, GmbH.

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