Maskless Lithography System

Heidelberg Instruments, GmbH (Heidelberg, Germany), has installed a DWL66 maskless lithography system at UCLA Nanoelectronics Research Facility, located in Los Angeles, California.

Caption: The DWL66 is a maskless lithography system for mask making and direct writing.

The DWL66 is a maskless lithography system for mask making and direct writing. This system is capable of producing patterns down to 0.6 microns, and is equipped with the capability of thick resist and gray scale exposure, in addition to metrology, front to backside and layer-to-layer alignment. Mr. Steve Franz, Manager of UCLA Nanoelectronics Research Facility, said, "The UCLA Nanoelectronics Research Facility's recent installation of the Heidelberg DWL 66 Mask Writer will enable it to support a wide range of projects including fabricating optical gratings, photonic structures, MOS devices and MEMS devices including microfluidic channels, actuators and sensors. The ability to make masks quickly and inexpensively in-house will encourage our customers to experiment with their designs and prototypes more freely." The maskless lithography systems produced by Heidelberg are capable of exposing substrates up to 2.4 meter by 1.9 meter. These systems are used for direct writing and photomask production, in the areas of MEMS, bioMEMS, nanotechnology, ASICS, TFT, plasma displays, micro optics, and many other applications.

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